S. Bajt | DESY | EUV optics for free electron lasers |
M. Bender | AMTC | EUV metrology for mask makers |
A. BenMoussa | ROB | Developments of detectors for the Extreme Ultraviolet Imager telescopes (EUI) onboard Solar Orbiter |
B. Bodermann | PTB | VUV and EUV scatterometry |
T. Böttger | Carl Zeiss SMT | In-house EUV reflectometry at Carl Zeiss SMT |
N. Bowering | Cymer | LPP light source development for EUV lithography at Cymer |
S. Braun | IWS | Sputter technologies for the development of EUV and X-ray mirrors |
S. Burger | ZIB | Investigation of 3D patterns on EUV masks |
T. Gießel | BESTEC | How to spec laboratory instruments |
A. Gottwald | PTB | Characterization of VUV and EUV radiation detectors |
H. Groß | PTB | Model based uncertainty estimation for inverse scatterometry |
L. Haspeslagh | IMEC | Development of reliable EUV detectors |
L. Juschkin | RWTH | Metrology applications of XUV laboratory sources |
M. Krumrey | PTB | X-ray reflectometry and small angle scattering |
C. Laubis | PTB | Characterization of EUV and XUV optical elements |
R. Lebert | Bruker | EUV mask reflectometer |
E. Louis | FOM | Multilayer development for next generation EUVL optics |
S. Müllender | Carl Zeiss SMT | Overview EUV lithography at Carl Zeiss SMT |
L. Nanver | TU Delft | Silicon boron-layer photodiodes for detecting low penetration-depth beams |
S. Nihtianov | ASML | Application challenges of radiation detectors in EUV lithography |
M. Perske | IOF | Multilayer coating for EUV collector mirrors |
A. Rathsfeld | WIAS | Born approximation for scattering by rough interfaces |
F. Schäfers | HZB | EUV and XUV ellipsometry and polarimetry at BESSY |
F. Scholze | PTB | The new EUV radiometry beamline at the Metrology Light Source |
L. Shi | TU Delft | EUV detector radiation and environmental hardness |
H. Stiel | MBI | Laser based plasma sources for XUV |
R. Vest | NIST | EUV metrology at NIST SURF III for lithography, astronomy, solar physics, and particle detection applications |
S. Yulin | IOF | Development of EUV/X-ray multilayer optics in IOF |
U. Zeitner | IOF | Gratings for short wavelengths |