S. Bajt

DESY

EUV optics for free electron lasers

M. Bender

AMTC

EUV metrology for mask makers

A. BenMoussa

ROB

Developments of detectors for the Extreme Ultraviolet Imager telescopes (EUI) onboard Solar Orbiter

B. Bodermann

PTB

VUV and EUV scatterometry

T. Böttger

Carl Zeiss SMT

In-house EUV reflectometry at Carl Zeiss SMT

N. Bowering

Cymer

LPP light source development for EUV lithography at Cymer

S. Braun

IWS

Sputter technologies for the development of EUV and X-ray mirrors

S. Burger

ZIB

Investigation of 3D patterns on EUV masks

T. Gießel

BESTEC

How to spec laboratory instruments

A. Gottwald

PTB

Characterization of VUV and EUV radiation detectors

H. Groß

PTB

Model based uncertainty estimation for inverse scatterometry

L. Haspeslagh 

IMEC

Development of reliable EUV detectors

L. Juschkin

RWTH

Metrology applications of XUV laboratory sources

M. Krumrey

PTB

X-ray reflectometry and small angle scattering

C. Laubis

PTB

Characterization of EUV and XUV optical elements

R. Lebert

Bruker

EUV mask reflectometer

E. Louis

FOM

Multilayer development for next generation EUVL optics

S. Müllender

Carl Zeiss SMT

Overview EUV lithography at Carl Zeiss SMT

L. Nanver

TU Delft

Silicon boron-layer photodiodes for detecting low penetration-depth beams

S. Nihtianov

ASML

Application challenges of radiation detectors in EUV lithography

M. Perske

IOF

Multilayer coating for EUV collector mirrors

A. Rathsfeld

WIAS

Born approximation for scattering by rough interfaces

F. Schäfers

HZB

EUV and XUV ellipsometry and polarimetry at BESSY

F. Scholze

PTB

The new EUV radiometry beamline at the Metrology Light Source

L. Shi

TU Delft

EUV detector radiation and environmental hardness

H. Stiel

MBI

Laser based plasma sources for XUV

R. Vest

NIST

EUV metrology at NIST SURF III for lithography, astronomy, solar physics, and particle detection applications

S. Yulin

IOF

Development of EUV/X-ray multilayer optics in IOF

U. Zeitner

IOF

Gratings for short wavelengths